Enhanced Spatial PEB Uniformity through a Novel Bake Plate Design | Semantic Scholar
Process Setup and Optimization • LithExx-Systems
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar
Intel and Nikon Litho Specialists Discuss Overlay Matching and Edge Placement Error for Production Beyond 20 nm
CD uniformity maps obtained using the optical technique described... | Download Scientific Diagram
CD Uniformity comparison of random contact windows with ArF and KrF... | Download Scientific Diagram
Global CD uniformity measurement of target line width 75nm on wafer... | Download Scientific Diagram
Intrawafer CD uniformity trend for Etch GATE in 40nm > 30% CD... | Download Scientific Diagram
CD uniformity control for thick resist process
Contact local CD uniformity optimization through etch shrink
Process Setup and Optimization • LithExx-Systems
Sub-20 nm multilayer nanopillar patterning for hybrid SET/CMOS integration - ScienceDirect
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Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar
Effect of Wetting Time on CD Uniformity in Immersion Lithography
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In-field CD uniformity (CDU) of 32nm HP L/S pattern. | Download Scientific Diagram
Global CD uniformity measurement based on 15 points on a reticle. 5 The... | Download Scientific Diagram
Critical Dimension Control and its Implications in IC Performance - ppt download
Extending ArFi to 22 nm and Beyond with Advanced CDU Control
CD uniformity over the image field (range) versus focus for 0.25 µm... | Download Scientific Diagram
Contact local CD uniformity optimization through etch shrink
Global CD uniformity measurement based on 64 points on a test mask.... | Download Scientific Diagram
The Global Variation of Photoresist Topography and CD Uniformity due to Local High Step
Contact local CD uniformity optimization through etch shrink
